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Stiletto IPM for 200mm Sputter Etch Clean
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Particle Detection System for In Situ Metrology and Process Control
Stiletto IPM is a particle detection system capable of in situ metrology and process control, enabling yield and productivity improvements for the most advanced semiconductor processes. Stiletto is the first in situ particle monitoring (ISPM) system to be fully integrated with the process tool. When combined with parametric tool data, particle counts can be overlaid with equipment status to allow engineers to identify the exact time and cause of particle formation. Stiletto's ability to detect particles during every run of every wafer provides unprecedented protection against defect-induced yield loss.
Scanning for Greater Sensitivity
The Stiletto resonant scanner continuously monitors a much larger volume than the stationary laser beam systems used in existing in situ particle monitors, so Stiletto is able to provide statistically significant count rates for process control. In addition, repeatedly scanning the same volume permits autocorrelation, an advanced signal processing technique that virtually eliminates false counts. This combination of cutting-edge technologies delivers submicron sensitivity that detects "killer particles" while avoiding nuisance events. So you get reliable fault detection for every wafer, every run, every time.
Features at a Glance:
- resonant scanning laser for increased detection area and accurate particle sizing
- advanced signal processing confirms particle events and virtually eliminates false alarms
- reduces costs by improving yield and reducing test wafer
- improves productivity and tool availability
- sensor bus communication is compliant with existing AEC/APC systems
- available for pump-line and above-wafer applications in process chambers, transfer chambers and loadlocks
ASSOCIATED TECHNICAL INFORMATION:
ASSOCIATED TECHNICAL INFORMATION
Brochures and Datasheets:
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Brochure - Stiletto Scanning-Laser Particle Detector
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Technical Information:
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Application Note - Endpoint Detection for Chamber Clean / Novellus SPEED Nitride CVD
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Application Note - Integrated Process Monitoring for Sputter Etch Clean
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