Detects photoresist in PVD tool degas chambers, mitigating contamination that can cause costly downtime and extensive clean-up
A developing metallization wafer always absorbs water vapor, other gases and impurities (e.g., hydrocarbons and photoresist) from the previous processes. These gases and impurities degrade film properties and therefore must be desorbed and driven off the wafer before further films are deposited. The wafer degas module is intended to fulfill this requirement in a PVD cluster tool.
Degas process monitoring using an Integrated Process Monitor (IPM) is critical to insure good product yield and throughput of a PVD cluster tool. Not only do these chambers see the worst of what is potentially on a wafer with regards to contamination, they are of critical importance in ensuring the complete removal of volatiles that will adversely affect deposited films.
The INFICON Integrated Process Monitor (IPM) continuously polices degas chambers and detects wafers contaminated with photoresist in 200mm and 300mm PVD cluster tools. The IPM scans each wafer as it is degassed and sounds an alarm when even trace amounts of photoresist compounds remain on a wafer due to an incomplete or missed strip. A signal from the high-sensitivity sensor can be used to automatically shutdown a cluster tool to contain damage and avoid costly yield problems.
Proven reliable during extensive testing on production tools, the INFICON IPM can help eliminate the effects of catastrophic tool contamination.
Preclude Photoresist Detector for 200mm PVD Degas Chambers
Transpector CPM Compact Process Monitor
ASSOCIATED TECHNICAL INFORMATION
Technical Information:
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Transpector CPM - Integrated Process Monitor for 300mm High Pressure Degas
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 | | Typical output when monitoring wafer degas using INFICON IPM |
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