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Integrated Process Monitoring
Integrated Process Monitoring delivers direct measurement of process conditions for on-time metrology. INFICON Integrated Process Monitors harness the power of in situ sensors measuring actual process conditions to provide equipment, process and wafer metrology in real-time.
IPM Applications - Total Metrology
Equipment Metrology:
- Vacuum System Diagnostics
- Base Vacuum Check
- Inter-wafer Monitoring
- Helium Leak Checking
- Vacuum Integrity
- PM Recovery Qualification
- Particle Source Identification
- Fault Detection
Process Metrology:
- Chamber Clean Prediction
- Automated Statistical Process Control (SPC)
- Automated Report Generation
- Chamber Clean Endpoint
- Process Endpoint
Wafer Metrology:
- Film Property Modeling
- Yield Prediction
Features at a Glance
- Integration and synchronization of advanced sensors
- Real-time monitoring and interpretation of complex process variables
- Tool integration based on excursion detection
- Manual operation for tool troubleshooting
- Local process and equipment data archive
INFICON Integrated Process Monitors
Preclude Photoresist Detector for 200mm PVD Degas Chambers
Detects photoresist in PVD tool degas chambers, mitigating contamination that can cause costly downtime and extensive clean-up.
RF Sensor Technology with FabGuard Sensor Integration and Analysis System
Provides Real-time Plasma Process Analysis to Significantly Reduce Process Variability
Stiletto IPM for 200mm Sputter Etch Clean
Particle Detection System for In Situ Metrology and Process Control
Transpector IPM Gas Analysis System
Automated Monitoring and Diagnostics System for High Vacuum Chambers
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